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Few layered MoS2 lithography with an AFM tip: description of the technique and nanospectroscopy investigations

  Articoli su Riviste JCR/ISI  (anno 2015)

Autori:  Donarelli M., Perrozzi F., Bisti F., Paparella F., Feyer V., Ponzoni A., Gonchigsuren M., Ottaviano L

Affiliazione Autori:  Department of Physical and Chemical Sciences, University of L’Aquila, Via Vetoio 10, 67100 L’Aquila, Italy; Sincrotrone Trieste S.C.p.A., NanoESCA Beamline, 34012 Basovizza, Trieste, Italy; CNR-INO Brescia, Via Branze 38, 25123 Brescia, Italy; School of Applied Sciences, MUST, Bagatoiruu, Ulaanbaatar 14191, Mongolia; CNR-SPIN, UOS L’Aquila, Via Vetoio 10, 67100 L’Aquila, Italy

Riassunto:  A novel technique to lithograph the MoS2 surface is described here. Mechanically exfoliated MoS2 flakes have been patterned with an atomic force microscope tip. After the patterning process, the lithographed areas have been removed by selective chemical etching. The electronic properties of the MoS2 flakes have been analyzed with spatially resolved photoelectron spectroscopy, with tunable incident photon energy, provided by a synchrotron light source. Tens of meV core level shifts can be recorded in relation to the flakes edges, coming from both the exfoliation and from the lithography.

Rivista/Giornale:  NANOSCALE
Volume n.:  7 (26)      Pagine da: 11453  a: 11459
DOI: 10.1039/c5nr02337h

*Impact Factor della Rivista: (2015) 7.760   *Citazioni: 12
data tratti da "WEB OF SCIENCE" (marchio registrato di Thomson Reuters) ed aggiornati a:  19/05/2019

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