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Photolithography by a tunable electro-optical lithium niobate phase array

  Articoli su Riviste JCR/ISI  (anno 2007)

Autori:  Paturzo M., Del Core C., Grilli S., De Nicola S., Ferraro P., De Natale P., Coppola G., Iodice M., Gioffré M

Affiliazione Autori:  Istituto Nazionale di Ottica Applicata, CNR and LENS, European Laboratory for Nonlinear Spectroscopy, Via Campi Flegrei 34, 80078 Pozzuoli (Na), Italy; Istituto Microelettronica e Microsistemi, CNR, Via P. Castellino 111, 80131, Napoli, Italy

Riassunto:  Photolithography experiments are performed by means of an optical phase mask with electrooptically tunable phase step. The phase mask consists of a 2-dimensional hexagonal lattice of inverted ferroelectric domains fabricated on a z-cut lithium niobate substrate. The electro-optically tunable phase step, between inverted domain, is obtained by the application of an external electric field along the z axis of the crystal via transparent electrodes. The collimated beam of an argon laser passes through the phase mask and the near field intensity patterns, at different planes of the Talbot length and for different values of the applied voltage, are used for photolithographic experiments. Preliminary results are shown and further applications are discussed. © 2007 Tianjin University of Technology.

Rivista/Giornale:  OPTOELECTRONICS LETTERS
Volume n.:  3 (4)      Pagine da: 243  a: 245
Ulteriori informazioni:  This research was partially funded by the MIUR within the FIRB project ( No. RBNE01KZ94 ) and partially by the MIUR project (No.77 DD N.1105/2002)
DOI: 10.1007/s11801-007-6204-2


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